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DENTON SPUTTERING LOG SHEET-Please fill out as completely as possible for characterization and maintenance purposesSPUTTER SputterCalculated

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Date andPumpPre-Argon4-pointLiteratureCALCULATORTimeThickness

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Log In/SputterBaseDownSputterSputterSputterPressureArgonFilmSheetFilmBulkSputterFilmSputter

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Log OutSputterCathodePressureTimeTimeTimePowerCap.Man.FlowThicknessResistanceResistivityResistivityRateStressPowerTimeThicknessRateRun

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Name/Phone #TimesMaterialNumberSubstrate(Torr)(hours)(min)(min)(W)(mT)(%)(um)(ohm/sq)(uOhm-cm)(uOhm/cm)(nm/min)MPa(W)(min)(um)CommentsMore Commentsnm/min W#

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Brian3/28/2010YSZ2Glass7 x 10^-61 hour2 min304004.5500.25NA#VALUE!8.334001201RF power supply 2 used on cathode 2Target from materials science dept0.0208333333333331

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Brian3/28/2010YSZ2Glass7 x 10^-61 hour2 min1204004.5501.01NA#VALUE!8.424001201.01RF power supply 2 used on cathode 2Target from materials science dept0.0210416666666671

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